Fabrication of 50 nm line-and-space x-ray masks in thick Au using a 50 keV electron beam system
- 1 January 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (1), 118-121
- https://doi.org/10.1116/1.586284