High-Rate Deposition of Ferrite Films in Aqueous Solution by Light-Enhanced Ferrite Plating
- 1 August 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (8A), L1458
- https://doi.org/10.1143/jjap.29.l1458
Abstract
By irradiating the substrate surface with a Xe-lamp at 450 W/cm2, the deposition rate of Fe3O4 film in ferrite plating was increased by a factor of 10 (from ∼30 nm/min to ∼320 nm/min). The high deposition rate in light-enhanced ferrite plating cannot be simply ascribed to the increase of thermal energy.Keywords
This publication has 5 references indexed in Scilit:
- High speed deposition of high-quality ferrite films from aqueous solution at low temperatures (≤90 °C)Journal of Applied Physics, 1987
- Improvement in deposition rate and quality of films prepared by "thin liquid-film" ferrite plating method.Journal of the Magnetics Society of Japan, 1987
- Ferrite plating in aqueous solution: New technique for preparing magnetic thin filmJournal of Applied Physics, 1984
- Laser‐Enhanced Electroplating on Good Heat‐Conducting Bulk MaterialsJournal of the Electrochemical Society, 1983
- Investigation of Laser‐Enhanced Electroplating MechanismsJournal of the Electrochemical Society, 1981