Analyses of silicon wafers by a high-resolution secondary ion mass spectrometer
- 31 May 1978
- journal article
- Published by Elsevier in International Journal of Mass Spectrometry and Ion Physics
- Vol. 27 (1), 63-76
- https://doi.org/10.1016/0020-7381(78)80103-x
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- A stigmatic, second-order, double-focusing mass spectrometerInternational Journal of Mass Spectrometry and Ion Physics, 1978
- Ion Microprobe Mass AnalyzerJournal of Applied Physics, 1967
- Notizen: Die positive Sekundärionenemission von sauerstoffbedeckten MetallenZeitschrift für Naturforschung A, 1967
- THE APPLICATION OF MASS SPECTROMETRY TO THE STUDY OF SURFACES BY SPUTTERINGPublished by Elsevier ,1959
- Sputtering of Surfaces by Positive Ion Beams of Low EnergyJournal of Applied Physics, 1958
- Ion Source for Mass SpectrographyPhysical Review B, 1949