Evaporation Rate Monitor
- 1 July 1960
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 31 (7), 773-775
- https://doi.org/10.1063/1.1717041
Abstract
A method for controlling the deposition rate of vacuum deposited films is described. This paper presents details of the rate sensing device and furnace control system. The control system utilizes a saturable‐core reactor driven by the output of the rate monitor. This controls the furnace current, thus completing the system. Operation and calibration of the control system is described and experimental results are tabulated.Keywords
This publication has 2 references indexed in Scilit:
- Electron-Bombardment Detection of Noncondensable Molecular BeamsReview of Scientific Instruments, 1958
- Automatic Regulation of Thermionic EmissionJournal of Scientific Instruments, 1950