A high-intensity narrow bandwidth pulsed submillimeter laser for plasma diagnostics
- 1 February 1977
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 13 (2), 54-58
- https://doi.org/10.1109/jqe.1977.1069272
Abstract
A CH3F laser oscillator producing between 0.5 and 1 kW pulses lasting 400 ns and confined to less than 27-MHz bandwidth at 496 μm is the basis of an injection laser assembly which generates up to 250 kW of far-infrared (FIR) output within a bandwidth of 55 MHz.Keywords
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