Superhydrophobic CFxCoating via In-Line Atmospheric RF Plasma of He−CF4−H2

Abstract

Stable superhydrophobic coatings on various substrates are attained with an in-line atmospheric rf plasma process using CF₄, H₂, and He. The coating layer is composed of CF_x nanoparticulates and has an average roughness of ∼10 nm. This roughness is much smaller than other surfaces reported for superhydrophobicity in the literature. The superhydrophobic coatings are produced on both metallic and insulating substrates without any need of separate microroughening or vacuum lines.