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Surface State Generation in MOS Structure by Applying High Field to the SiO
2
Film
Home
Publications
Surface State Generation in MOS Structure by Applying High Field to the SiO
2
Film
Surface State Generation in MOS Structure by Applying High Field to the SiO
2
Film
MN
Masaru Nakagiri
Masaru Nakagiri
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1 October 1974
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 13
(10)
,
1610-1617
https://doi.org/10.1143/jjap.13.1610
Abstract
No abstract available
Keywords
ELECTRIC FIELD
Cited by 18 articles