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Optical properties of x-ray lithography masks
Home
Publications
Optical properties of x-ray lithography masks
Optical properties of x-ray lithography masks
YV
Y. Vladimirsky
Y. Vladimirsky
JM
J. R. Maldonado
J. R. Maldonado
OV
O. Vladimirsky
O. Vladimirsky
AS
A. Starikov
A. Starikov
RF
R. Fuentes
R. Fuentes
DG
D. Guarnieri
D. Guarnieri
SW
S. W. Whitehair
S. W. Whitehair
JC
J. Cuomo
J. Cuomo
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1 November 1990
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 8
(6)
,
1579-1583
https://doi.org/10.1116/1.585119
Abstract
No abstract available
Keywords
OPTICAL PROPERTIES
RAY LITHOGRAPHY
LITHOGRAPHY MASKS
X RAY
Cited by 7 articles