Investigation of structure profiles in negative resists
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4), 329-334
- https://doi.org/10.1016/0167-9317(86)90061-4
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Photoelectron exposure of x-ray resistsMicroelectronic Engineering, 1985
- X-ray lithographyPublished by Springer Nature ,1977