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High‐rate sputtering of aluminum for metallization of integrated circuits
Home
Publications
High‐rate sputtering of aluminum for metallization of integrated circuits
High‐rate sputtering of aluminum for metallization of integrated circuits
PM
P. S. McLeod
P. S. McLeod
LH
L. D. Hartsough
L. D. Hartsough
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1 January 1977
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science and Technology
Vol. 14
(1)
,
263-265
https://doi.org/10.1116/1.569136
Abstract
No abstract available
Keywords
INTEGRATED CIRCUIT
Cited by 35 articles