Formation of thick titanium carbide films by the hollow cathode discharge reactive deposition process
- 1 October 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 54 (1), 51-60
- https://doi.org/10.1016/0040-6090(78)90276-6
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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