Extended energy loss fine structure analysis of hard and elastic carbon nitride thin films
- 15 July 1997
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 82 (2), 666-669
- https://doi.org/10.1063/1.365596
Abstract
In this article an electron energy loss spectroscopy investigation of CN x thin films is reported. The bonding, composition, and structure are discussed and a more thorough extended energy lossspectroscopy investigation is carried out to determine the interatomic distances. The extended energy loss fine structureanalysis reveals a component with an unusually high frequency in the data corresponding to an interatomic distance of approximately 7.3 Å. This is suggested to originate from backscattering from distant curved atomic layers.Keywords
This publication has 6 references indexed in Scilit:
- Hard elastic carbon thin films from linking of carbon nanoparticlesNature, 1996
- Preparation and characterization of carbon nitride thin filmsThin Solid Films, 1996
- Superhard and Elastic Carbon Nitride Thin Films Having Fullerenelike MicrostructurePhysical Review Letters, 1995
- Reactive magnetron sputter deposition of CNx films on Si(001) substrates: film growth, microstructure and mechanical propertiesThin Solid Films, 1994
- EELS analysis of vacuum arc-deposited diamond-like filmsPhilosophical Magazine Letters, 1988
- Ab initio calculations of amplitude and phase functions for extended x-ray absorption fine structure spectroscopyJournal of the American Chemical Society, 1979