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Room Temperature Instabilities of p‐Channel Silicon Gate MOS Transistors
Home
Publications
Room Temperature Instabilities of p‐Channel Silicon Gate MOS Transistors
Room Temperature Instabilities of p‐Channel Silicon Gate MOS Transistors
HN
Haruo Nakayama
Haruo Nakayama
YO
Yoshihiro Osada
Yoshihiro Osada
MS
Masahiro Shindo
Masahiro Shindo
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1 August 1978
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 125
(8)
,
1302-1306
https://doi.org/10.1149/1.2131667
Abstract
No abstract available
Cited by 8 articles