Optimizing deposition parameters of electron beam evaporated TiO_2 films
- 1 December 1988
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 27 (23), 4920-4924
- https://doi.org/10.1364/ao.27.004920
Abstract
A study of the major deposition parameters including source material, oxygen partial pressure, substrate temperature, and deposition rate affecting the optical quality of electron beam evaporated TiO2 films is presented. After careful optimization of these parameters it is possible to reproducibly deposit TiO2 films from TiO2 source material mixed with 5% CeO2 at an oxygen partial pressure of 5 × 10−5 Torr, a substrate temperature of 320°C, and a deposition rate of 2 Å/s.This publication has 5 references indexed in Scilit:
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