The influence of diamond chemical vapour deposition coating parameters on the microstructure and properties of titanium substrates
- 1 April 1996
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 5 (3-5), 304-307
- https://doi.org/10.1016/0925-9635(95)00378-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The influence of the growth process on the film texture of epitaxially nucleated diamond on silicon (001)Diamond and Related Materials, 1995
- Diamond, diamond-like and titanium nitride biocompatible coatings for human body partsMaterials Science and Engineering B, 1994
- Heteroepitaxial diamond growth on (100) siliconDiamond and Related Materials, 1993
- Chemical vapour deposition and characterization of smooth {100}-faceted diamond filmsDiamond and Related Materials, 1993
- Wasserstoffversprödung von Titan und TitanlegierungenMaterialwissenschaft und Werkstofftechnik, 1974