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Use of the ring gap plasmatron for high rate sputtering
Home
Publications
Use of the ring gap plasmatron for high rate sputtering
Use of the ring gap plasmatron for high rate sputtering
SS
S. Schiller
S. Schiller
UH
U. Heisig
U. Heisig
KG
K. Goedicke
K. Goedicke
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1 January 1977
journal article
Published by
Elsevier
in
Thin Solid Films
Vol. 40
,
327-334
https://doi.org/10.1016/0040-6090(77)90134-1
Abstract
No abstract available
Keywords
RING GAP
GAP PLASMATRON
RATE SPUTTERING
HIGH RATE
Cited by 46 articles