Combination of nanoimprint and scanning force lithography for local tailoring of sidewalls of nanometer devices
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4), 221-224
- https://doi.org/10.1016/s0167-9317(00)00301-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Polymer issues in nanoimprinting techniqueSolid-State Electronics, 1999
- Suitability of new polymer materials with adjustable glass temperature for nano-imprintingMicroelectronic Engineering, 1999
- Problems of the nanoimprinting technique for nanometer scale pattern definitionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Hot embossing in polymers as a direct way to pattern resistMicroelectronic Engineering, 1998