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A self-aligned cobalt silicide technology using rapid thermal processing
Home
Publications
A self-aligned cobalt silicide technology using rapid thermal processing
A self-aligned cobalt silicide technology using rapid thermal processing
LH
L. Van Den Hove
L. Van Den Hove
RW
R. Wolters
R. Wolters
KM
K. Maex
K. Maex
RK
R. De Keersmaecker
R. De Keersmaecker
GD
G. Declerck
G. Declerck
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1 November 1986
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 4
(6)
,
1358-1363
https://doi.org/10.1116/1.583458
Abstract
No abstract available
Cited by 93 articles