Photo-MOCVD of PbTiO3 thin films
- 1 December 1991
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 115 (1-4), 289-293
- https://doi.org/10.1016/0022-0248(91)90755-t
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology (01460141)
- Foundation for Promotion of Material Science and Technology of Japan
- Mazda Foundation
- Murata Science Foundation
This publication has 4 references indexed in Scilit:
- Preparation of c-Axis-Oriented PbTiO3 Thin Films by MOCVD under Reduced PressureJapanese Journal of Applied Physics, 1989
- Characterization of MOCVD PbTiO3thin filmsFerroelectrics, 1989
- Effect of deposition parameters on the deposition characteristics of chemically vapour deposited PbTiO3Thin Solid Films, 1988
- Photolysis of nitrogen dioxideThe Journal of Chemical Physics, 1973