Coalescence of Sulfides during Secondary Growth in 3% Silicon—Iron
- 1 March 1967
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 38 (3), 1085-1086
- https://doi.org/10.1063/1.1709496
Abstract
The behavior of manganese sulfide inclusions in the development of the cube‐on‐edge texture in 3% silicon—iron was investigated. Primary‐recrystallized specimens of two commercial alloys were heated from 590°C to 760°, 870°, 980°, 1090°, and 1200°C in dry hydrogen. The sulfide‐particle sizes were measured as a function of annealing temperature by electron microscopy. The measurements showed that a marked coalescence of the particles occurred between 870° and 980°C. In one of the alloys studied, vigorous secondary grain growth took place concurrently with the coalescence of the inclusions. The secondary growth was complete before any sulfur was removed from the specimens by diffusion. In the second alloy, which had a weaker cube‐on‐edge component in the primary recrystallization texture, normal grain growth occurred despite a similar coalescence of the sulfide particles.Keywords
This publication has 2 references indexed in Scilit:
- Small Angle X-Ray Scattering from MnS in Silicon SteelsJournal of Applied Physics, 1962
- Effect of Impurities on the Temperature Dependence of the (110) [001] Texture in Silicon-IronJournal of Applied Physics, 1959