Investigation of background radical sources in a Teflon-film irradiation chamber
- 31 July 1989
- journal article
- research article
- Published by American Chemical Society (ACS) in Environmental Science & Technology
- Vol. 23 (8), 970-978
- https://doi.org/10.1021/es00066a007
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- LSODE and LSODI, two new initial value ordinary differential equation solversACM SIGNUM Newsletter, 1980
- A smog chamber and modeling study of the gas phase NOx–air photooxidation of toluene and the cresolsInternational Journal of Chemical Kinetics, 1980
- Chemiluminescence method for atmospheric monitoring of nitric acid and nitrogen oxidesAnalytical Chemistry, 1978