Electrochemically Controlled Thinning of Silicon
- 1 March 1970
- journal article
- website
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Bell System Technical Journal
- Vol. 49 (3), 473-475
- https://doi.org/10.1002/j.1538-7305.1970.tb01783.x
Abstract
A method for precision thinning silicon integrated circuit slices has been developed whereby either n or p type regions may be selectively removed from material of opposite conductivity. The existence of a simple and economical means to attain precis...Keywords
This publication has 1 reference indexed in Scilit:
- Anisotropic etching for forming isolation slots in silicon beam leaded integrated circuitsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1967