Thermodynamic Study of the Transport and Epitaxial Growth of GaAs in an Open Tube

Abstract
A theory based on a thermodynamic analysis is developed and compared with experimental results obtained for transport and epitaxial growth of GaAs in GaAs-AsCl3-H2 system. The transport rate of source GaAs and the growth rate of epitaxial layers are discussed as a function of the hydrogen flow rate, the source and substrate temperatures, the mole ratio of Cl2/H2, the reaction time and the substrate orientation. A reasonable agreement is found between the theory and experimental results except the effect of the substrate orientation on growth rate.

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