Maskless etching of microstructures using a scanning microplasma etcher
- 26 May 2006
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 506-507, 235-238
- https://doi.org/10.1016/j.tsf.2005.08.271
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 8 references indexed in Scilit:
- Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jetsJournal of Applied Physics, 2004
- An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid samplePlasma Sources Science and Technology, 2003
- Maskless etching of silicon using patterned microdischargesApplied Physics Letters, 2001
- Application of microscale plasma to material processingThin Solid Films, 2001
- Spatiotemporal behaviors of excited Xe atoms in unit discharge cell of ac-type plasma display panel studied by laser spectroscopic microscopyJournal of Applied Physics, 2000
- A Molecular Emission Detector on a Chip Employing a Direct Current MicroplasmaAnalytical Chemistry, 1999
- Microdischarge devices fabricated in siliconApplied Physics Letters, 1997
- Microhollow cathode dischargesApplied Physics Letters, 1996