Interface states at the anodized Al2O3-metal interface
- 15 May 2001
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 89 (10), 5502-5508
- https://doi.org/10.1063/1.1366653
Abstract
The capacitance of Al–Al 2 O 3 -metal capacitors with Al 2 O 3 of different thicknesses, formed by anodizing evaporated Al films in ethylene glycol-based or H 2 O -based electrolytes to different voltages, has been measured between 10 kHz and 1 MHz for ten metal electrodes. The linear dependence of inverse capacitance on anodizing voltage, and thus on Al 2 O 3 thickness, shows that there is an interface capacitance in series with the bulk capacitance due to the dielectric properties of anodized Al 2 O 3 . The interface capacitance, C I , is not a characteristic of the Al 2 O 3 -metal combination; it depends on the vacuum deposition conditions for the metal electrodes. C I is associated with interface states at the Al 2 O 3 -metal interface, not with field penetration into metal electrodes.Keywords
This publication has 28 references indexed in Scilit:
- Frequency-dependent interface capacitance of Al–Al2O3–Al tunnel junctionsApplied Physics Letters, 1999
- Investigation of bulk and interfacial properties of Ba0.5Sr0.5TiO3 thin film capacitorsApplied Physics Letters, 1998
- Interfacial CapacitancePhysica Status Solidi (b), 1990
- Interface contribution to the capacitance of thin-film Al-Al2O3-Al trilayer structuresApplied Physics Letters, 1987
- The effect of spatial dispersion of the dielectric permittivity on the capacitance of thin insulating films: Non-linear dependence of the inverse capacitance on film thicknessThin Solid Films, 1981
- Dielectric and optical properties of ZnS filmsThin Solid Films, 1973
- Investigation of Al2O3 film-thickness by tunnel emission and capacitance measurementsSolid State Communications, 1967
- AN ANALYTIC FORM OF KU AND ULLMANS EQUATIONSApplied Physics Letters, 1965
- Capacitance of Thin Dielectric StructuresJournal of Applied Physics, 1964
- Anomalous Capacitance of Thin Dielectric StructuresPhysical Review Letters, 1961