Characteristics of ion-implanted contacts for nuclear particle detectors: I. Window thickness of ion-implanted semiconductor detectors
- 1 May 1969
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 70 (3), 279-284
- https://doi.org/10.1016/0029-554x(69)90051-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- ION IMPLANTATION OF SILICON: II. ELECTRICAL EVALUATION USING HALL-EFFECT MEASUREMENTSCanadian Journal of Physics, 1967
- The fabrication of high quality silicon junction detectors by low energy ion implantationThe European Physical Journal A, 1967