For over two decades, researchers have investigated a wide variety of technologies for use as a real-time infrared scene generator. During the past several years, the most promising technology to meet the myriad of applications appears to be the silicon micromachined resistive-array approach. Each thermal pixel is created by a micro-scale resistor. The present investigation reports the results achieved by using the standard commercial CMOS foundry process, rather than a costly custom CMOS process, to produce the chip and the subsequent post-foundry etching. Both chip-level and pixel-specific electronics are readily included on the chip since IC technology is employed. Principles used in device architecture formulation, chip design, and fabrication of large arrays of these thermal pixels are discussed. Experimental results of recent array designs are presented and illustrate that low-cost, high-performance flat- panel thermal infrared displays are now viable and practicable.