Plasma spectroscopy for polymer deposition

Abstract

Optical spectroscopy of plasma for polymer deposition has been performed for two capacitive discharges : LF 10-100 kHz and HF 13.6 MHz at gas pressure of 1-2 torr and mean electrical power of 10-30 Watts Emission of the negative glow near the substrate was analysed by emission and absorption spectroscopy. Mixtures of argon with reactive gases (1-10 %) such as H2, O2, C2H 2, (CH3)6Si,NH and (CH3)3SiOC 2H5 have been investigated. Optical emissions of specific species have been identified in each gas mixture. Ionization and intensity of reactive species were found to be higher in LF than in HF. Inversely in the HF discharge the Ar( 3P2) metastable levels were more populated. Impurity emissions such as from CN and N2 in argon are discussed