The use of a quartz crystal microbalance to study the oxidation of aluminum during vacuum deposition
- 1 March 1971
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 7 (3-4), 277-285
- https://doi.org/10.1016/0040-6090(71)90074-5
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Quartz Crystal Microbalance Techniques Applicable to the Studies of Sulphuration and Oxidation of Thin Metal FilmsJapanese Journal of Applied Physics, 1969
- Quartz-Crystal Microbalance Technique for the Preparation of Alkali-Antimonide PhotocathodesJournal of Applied Physics, 1968
- Evaporation and Deposition Rates, Sticking Probability, and Background Pressure during the Production of Thin Films in VacuumJournal of Applied Physics, 1966
- Measurement of the Sticking Coefficients of Silver and Gold in an Ultrahigh VacuumJournal of Applied Physics, 1966
- Electrical Properties of Evaporated Aluminum Oxide FilmsJournal of the Electrochemical Society, 1962
- The Structure of Extremely Thin Layers Evaporated in Kinetic Vacuum SystemsJournal of Applied Physics, 1949