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Silicon dioxide fine patterning by reactive fast atom beam etching
Home
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Silicon dioxide fine patterning by reactive fast atom beam etching
Silicon dioxide fine patterning by reactive fast atom beam etching
HK
Hiroki Kuwano
Hiroki Kuwano
FS
Fusao Shimokawa
Fusao Shimokawa
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1 September 1988
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 6
(5)
,
1565-1569
https://doi.org/10.1116/1.584215
Abstract
No abstract available
Cited by 16 articles