Characterisation of an RF atomic nitrogen plasma source
- 31 May 1999
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 201-202, 399-401
- https://doi.org/10.1016/s0022-0248(98)01361-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- GaN growth by a controllable RF-excited nitrogen sourceJournal of Crystal Growth, 1995
- A microwave discharge atom beam source of high intensityMeasurement Science and Technology, 1992