Compensation mechanisms in GaAs
- 1 May 1980
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 51 (5), 2840-2852
- https://doi.org/10.1063/1.327952
Abstract
Semi‐insulating GaAs materials, undoped or doped with concentration of chromium varying from 6×1015 to 4×1017 cm−3, have been studied using both Hall effect measurements and optical absorption measurements. It is definitively concluded that compensation comes from the presence of the deep donor EL2 in undoped materials, and from both this deep donor and the deep acceptor related to chromium in Cr‐doped materials. Sets of curves are given which allow the determination of ND‐NA, the concentration of shallow donors and acceptors, knowing the Hall mobility and the Cr concentration in a given sample. Such curves can be a working tool for assessing any piece of semi‐insulating GaAs in a routine way.Keywords
This publication has 21 references indexed in Scilit:
- Electrical compensation in semi-insulating GaAsJournal of Applied Physics, 1977
- A model relating electrical properties and impurity concentrations in semi-insulating GaAsJournal of Applied Physics, 1977
- Liquid Encapsulated Czochralski Growth of GaAsJournal of the Electrochemical Society, 1971
- Preparation of Oxygen-Doped GaAs in a Three-Zone Bridgman FurnaceJapanese Journal of Applied Physics, 1969
- The Preparation of Semi-Insulating Gallium Arsenide by Chromium DopingJournal of the Electrochemical Society, 1964
- Role of Oxygen in Reducing Silicon Contamination of GaAs during Crystal GrowthJournal of Applied Physics, 1963
- On the Preparation of High Purity Gallium ArsenideJournal of Applied Physics, 1962
- Preparation and characterization of high resistivity GaAsJournal of Physics and Chemistry of Solids, 1962
- Properties of Semi-Insulating GaAsJournal of Applied Physics, 1961
- Energy-Level Model for High-Resistivity Gallium ArsenideNature, 1961