Structural origin of V-defects and correlation with localized excitonic centers in InGaN/GaN multiple quantum wells

Abstract

In the growth of InGaN/GaN multiple quantum well (MQW) structures, a novel defect (called the “V-defect”) initiates at threading dislocations in one of the first quantum wells in a MQW stack. This defect is common to almost all InGaN MQW heterostructures. The nature of the V-defect was evaluated using transmission electron microscopy (TEM), scanning TEM (STEM), and low-temperature cathodoluminescence (CL) on a series of ${\mathrm{In}}_{\mathrm{0.20}}{\mathrm{Ga}}_{\mathrm{0.80}}\mathrm{N/GaN}$ MQW samples. The structure of the V-defect includes buried side-wall quantum wells (on the {101̄1} planes) and an open hexagonal inverted pyramid which is defined by the six {101̄1} planes. Thus, in cross section this defect appears as an open “V”. The formation of the V-defect is kinetically controlled by reduced Ga incorporation on the pyramid walls ({101̄1} planes). The V-defect is correlated with the localized excitonic recombination centers that give rise to a long-wavelength shoulder in photoluminescence (PL) and CL spectra. This long-wavelength shoulder has the following characteristics: (i) its intensity is correlated with the side-wall quantum wells; (ii) the temperature independence of the full width at half maximum strongly supports a localized exciton recombination process.