Thin-film thickness measurements with thermal waves
- 15 July 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 43 (2), 166-168
- https://doi.org/10.1063/1.94267
Abstract
We have developed a method for measuring the thickness of thin films that is nondestructive, noncontact and that can make measurements with 2‐μm spatial resolution (i.e., 2‐μm spot size) on both optically opaque as well as optically transparent films. With this method, which is based on the use of high‐frequency thermal waves, thicknesses of Al and SiO2 films on Si substrates have been measured in the 500–25 000‐Å range.Keywords
This publication has 9 references indexed in Scilit:
- Thermal-wave depth profiling: TheoryJournal of Applied Physics, 1982
- Photothermal deflection spectroscopy and detectionApplied Optics, 1981
- Optically detected photothermal imagingApplied Physics Letters, 1981
- Photo-displacement imagingElectronics Letters, 1981
- Theoretical aspects of photoacoustic spectroscopyJournal of Applied Physics, 1978
- Thermal diffusivity and thickness measurements for solid samples utilising the optoacoustic effectThe Analyst, 1977
- C–H vibrational states of benzene, naphthalene, and anthracene in the visible region by thermal lensing spectroscopy and the local mode modelThe Journal of Chemical Physics, 1976
- Theory of the photoacoustic effect with solidsJournal of Applied Physics, 1976
- Probing of Acoustic Surface Perturbations by Coherent LightApplied Optics, 1969