Factors influencing the accuracy of a quartz-crystal oscillator as a thickness monitor for thin-film deposition
- 1 September 1968
- journal article
- Published by Springer Nature in Il Nuovo Cimento B (1971-1996)
- Vol. 57 (1), 19-24
- https://doi.org/10.1007/bf02710309
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Crystal oscillator film thickness monitorNuclear Instruments and Methods, 1964
- On the production and properties of inhomogeneous thin filmsJournal de Physique, 1964
- Simple High Sensitivity Microbalance for Use in Ultra-High VacuumReview of Scientific Instruments, 1963
- Quartz Resonators; Reduction of Transient Frequency Excursion Due to Temperature ChangeJournal of Applied Physics, 1963
- Automatic control of film-deposition rate with the crystal oscillator for preparation of alloy filmsVacuum, 1962
- New Method for Measuring Sputtering in the Region Near ThresholdReview of Scientific Instruments, 1961
- Alloying Behavior of Thin Bimetal Films, Simultaneously or Successively DepositedJournal of Applied Physics, 1960
- Crystal Film Thickness MonitorReview of Scientific Instruments, 1959
- Verwendung von Schwingquarzen zur W gung d nner Schichten und zur Mikrow gungThe European Physical Journal A, 1959
- I. Etude du rayonnement de freinage interne, de l'autoionisation et des électrons émis simultanément avec le rayonnement β du phosphore 32Journal de Physique et le Radium, 1959