Infrared Studies of Reactively Sputtered SiOx Films in the Composition Range 0.2 ≦ x ≦ 1.9
- 1 March 1982
- journal article
- research article
- Published by Wiley in Physica Status Solidi (b)
- Vol. 110 (1), K69-K73
- https://doi.org/10.1002/pssb.2221100157
Abstract
No abstract availableKeywords
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