A multiple substrate-mask-source thin film deposition system
- 1 November 1973
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 44 (11), 1658-1660
- https://doi.org/10.1063/1.1686024
Abstract
A versatile and relatively inexpensive thin film deposition system which provides the selection of a number of substrate‐mask‐source arrangements is presented. The system, designed for use in a 36 cm ultrahigh vacuum chamber, uses one linear and one rotary feedthrough to accomplish all mechanical motion.Keywords
This publication has 4 references indexed in Scilit:
- Modular Thin Film Deposition SystemReview of Scientific Instruments, 1971
- Mechanical System for Multiple Thin Film DepositionReview of Scientific Instruments, 1966
- Simplified Technique for use in Multiple Thin-Film Deposition SystemsReview of Scientific Instruments, 1964
- A masking jig for multiple film depositionJournal of Scientific Instruments, 1963