Intrinsic thermal-resistive process of crystals: Umklapp processes at low and high temperatures
- 1 October 1996
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 54 (13), 8977-8980
- https://doi.org/10.1103/physrevb.54.8977
Abstract
Three-phonon umklapp processes are considered as the main intrinsic thermal-resistive processes in the crystals. The splitting umklapp processes are considered as the important process in thermal-resistive processes at low and high temperatures. Based upon a two-dimensional model, the simplest possible model is constructed for umklapp process. Real computational expressions are provided using the data of a phonon-dispersion relation of the direction of the principal reciprocal-lattice vectors and the given lattice characteristics. To test the model, the calculations are compared with the existing data of the purest crystals of LiF and NaF. © 1996 The American Physical Society.Keywords
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