High-rate deposition of SiO2 by modulated DC reactive sputtering in the transition mode without a feedback system
- 1 August 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 281-282, 213-217
- https://doi.org/10.1016/0040-6090(96)08616-6
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Reactive alternating current magnetron sputtering of dielectric layersJournal of Vacuum Science & Technology A, 1992