High-Speed Low-Power Ring Oscillator Using Inverted-Structure Modulation-Doped GaAs/n-AlGaAs Field-Effect Transistors
- 1 August 1985
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 24 (8R)
- https://doi.org/10.1143/jjap.24.1061
Abstract
Modulation-doped GaAs/n-AlGaAs field-effect transistors with inverted structures, i.e. undoped GaAs on top of n-AlGas, have been successfully used in E/D-type DCFL ring oscillators. An inverted heterojunction structure grown by MBE showed a high electron mobility of about 20,000–92,000 cm2/(Vs) at 77 K. In the enhancement mode (E-mode) FETs with 1.2 µm gate length, a maximum transconductance of 250 mS/mm and a K-value of 7.3 mA/V2 were achieved at 77 K. Low ohmic contact resistances of 0.1–0.4 Ωmm with a mean value of 0.2 Ωmm were obtained in a 2 inch-diameter wafer at 300 K and 77 K. A 21-stage ring oscillator showed a minimum gate delay of 26.3 ps with a power dissipation of 234 µW/gate at 77 K.Keywords
This publication has 2 references indexed in Scilit:
- Use of a superlattice to enhance the interface properties between two bulk heterolayersApplied Physics Letters, 1983
- Performance of Inverted Structure Modulation Doped Schottky Barrier Field Effect TransistorsJapanese Journal of Applied Physics, 1982