Studies by photothermal deflection spectroscopy of defect formation in a-Si:H

Abstract
The optical absorption spectra determined between 2 and 0–6 eV by a combination of optical transmission and photothermal deflection spectroscopy measurements for two a-Si:H samples deposited at 100 and 250°C have been carefully compared in the as-deposited, annealed and light-soaked states. The results as a whole are interpreted in a quantitative way by the recently proposed weak-bond-to-dangling-bond conversion model.