Silicide and Schottky barrier formation in the Ti-Si and the Ti-SiOx -Si systems

Abstract
Silicide and Schottky barrier formation has been characterized for Ti deposited on the Si(100) surface, both with and without surface oxides present. Reactions were carried out in ultrahigh vacuum, while observing electronic and chemical changes with ultraviolet photoemission spectroscopy and Auger electron spectroscopy. Ti deposited on Si shows a sharp interface, no change in Fermi level position, and no silicide formation until heated to 400–500 °C. Ti deposited on thin oxides (x forms near the surface. This differing behavior of thin and thick oxides is shown to be consistent with bulk thermodynamic data.