Testing Aspherics Using Two-Wavelength Holography
- 1 September 1971
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 10 (9), 2113-8
- https://doi.org/10.1364/ao.10.002113
Abstract
It is shown that both single exposure and double exposure two-wavelength holography provide a good method of using visible light to obtain an interferogram identical to what would be obtained if a longer nonvisible wavelength were used. Both techniques provide for the real-time adjustment of defocus and tilt in the final interferogram. When both hologram exposures are made simultaneously, the sensitivity to air turbulence is essentially the same as if the longer nonvisible wavelength were used. Results are shown for testing both lenses and mirrors at equivalent wavelengths at 6.45 micro, 9.47 micro, 14.20 micro, 20.22 micro, and 28.50 micro obtained by using an argon laser for the visible light source.This publication has 5 references indexed in Scilit:
- Application of Wax to Fine Ground Surfaces to Simulate PolishApplied Optics, 1969
- Multiple-Index Holographic ContouringApplied Optics, 1969
- A New Method for Generating Depth Contours HolographicallyApplied Optics, 1968
- Rough Surface Interferometry Using a CO_2 Laser SourceApplied Optics, 1968
- Multiple-Wavelength and Multiple-Source Holography Applied to Contour Generation*Journal of the Optical Society of America, 1967