Next generation lithography
Open Access
- 31 December 1999
- journal article
- Published by Elsevier in Materials Today
- Vol. 2 (2), 9-12
- https://doi.org/10.1016/s1369-7021(99)80003-0
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Extreme ultraviolet lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- A review of ion projection lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Scattering with angular limitation projection electron beam lithography for suboptical lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- X-ray lithography: Status, challenges, and outlook for 0.13 μmJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997