Multimode deposited silica waveguide and its application to an optical branching circuit
- 1 April 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 18 (4), 776-781
- https://doi.org/10.1109/jqe.1982.1071559
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Optical directional coupler using deposited silica waveguides (DS guides)IEEE Journal of Quantum Electronics, 1981
- Deposited silica waveguide for intergrated optical circuitsApplied Physics Letters, 1981
- Polymer optical circuits for multimode optical fiber systemsApplied Optics, 1980
- Thermophoretic Deposition of Small Particles in the Modified Chemical Vapor Deposition (MCVD) ProcessJournal of the American Ceramic Society, 1980
- Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasmaApplied Physics Letters, 1980
- Thermophoresis: The mass transfer mechanism in modified chemical vapor depositionJournal of Applied Physics, 1979
- Materials, Properties, and ChoicesPublished by Elsevier ,1979
- Chemical kinetics of the reactions of tetrachlorosilane, tetrabromosilane, tetrachlorogermane, phosphoryl chloride, and trichloroborane with oxygenThe Journal of Physical Chemistry, 1978
- Optical waveguide formed by electrically induced migration of ions in glass platesApplied Physics Letters, 1972