Morphological stability analysis in chemical vapour deposition processes. II
- 1 April 1978
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 43 (3), 371-377
- https://doi.org/10.1016/0022-0248(78)90396-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Morphological stability analysis in chemical vapour deposition processes. IJournal of Crystal Growth, 1978
- The chemistry and transport phenomena of chemical vapor deposition of silicon from SiCl4Journal of Crystal Growth, 1975
- Inelastic light scattering studies of silicon chemical vapor deposition (CVD) systemsJournal of Crystal Growth, 1975
- A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal ReactorJournal of the Electrochemical Society, 1970
- Silicon Epitaxy from Mixtures of SiH4 and HClJournal of the Electrochemical Society, 1970