A Definitive Heat of Vaporization of Silicon through Benchmark ab Initio Calculations on SiF4
- 19 May 1999
- journal article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry A
- Vol. 103 (23), 4427-4431
- https://doi.org/10.1021/jp9904466
Abstract
No abstract availableKeywords
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