Film growth and surface reactions ofon
- 15 October 1997
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 56 (15), 9918-9924
- https://doi.org/10.1103/physrevb.56.9918
Abstract
High-resolution electron-energy-loss spectroscopy (HREELS) has been used to characterize films up to 4 monolayers thick grown at room temperature on hydrogen-terminated Si(100). Our results show that compared with films on clean Si(100) surfaces a considerably higher degree of order in the as-deposited films is achieved. At low coverages the observed vibrational modes and the Si-H vibrations of the substrate are essentially unshifted, indicating a van der Waals–type interaction between and . After annealing at 450 K the film order is substantially increased. Annealing at 600 K results in desorption of the multilayers and a hydrogen-transfer reaction from the surface to the adsorbed monolayer molecules. When annealing the sample at 800 K, the remaining surface terminating hydrogen desorbs and evidence for a change in the bonding configuration is found. Finally, flashing the sample at 1300 K leads to the formation of silicon carbide.
Keywords
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