High resolution surface study by In-situ UHV transmission electron microscopy
- 31 December 1982
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 8 (1-2), 145-161
- https://doi.org/10.1016/0304-3991(82)90284-4
Abstract
No abstract availableKeywords
This publication has 28 references indexed in Scilit:
- An Ion-Sputtering Gun to Clean Crystal SurfacesIn-Situin an Ultra-High-Vacuum Electron MicroscopeJapanese Journal of Applied Physics, 1980
- Reflection Electron Microscope Observations of Dislocations and Surface Structure Phase Transition on Clean (111) Silicon SurfacesJapanese Journal of Applied Physics, 1980
- Electron Beam Evaporator forIn SituDeposition Studies of Refractory Metal Thin Films in UHV Electron MicroscopeJapanese Journal of Applied Physics, 1980
- Substrate-induced strain and orientational ordering in adsorbed monolayersPhysical Review B, 1979
- Techniques for routine UHV in situ electron microscopy of growth processes of epitaxial thin filmsJournal of Physics E: Scientific Instruments, 1978
- Approximations for the calculation of high-resolution electron-microscope images of thin filmsActa Crystallographica Section A, 1977
- On saw-tooth variation of residual strain in Sn particles epitaxially grown on SnTeJournal of Crystal Growth, 1975
- Adsorption and surface alloying of lead monolayers on (111) and (110) faces of goldJournal of Physics F: Metal Physics, 1974
- The observation of primary step growth in magnesium oxide by direct transmission electron microscopyPhilosophical Magazine, 1967
- Oberflächenstrukturen und Kristallbaufehler im elektronenmikroskopischen Bild, untersucht am NaCl (I)Physica Status Solidi (b), 1962