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Summary Abstract: Two-stage process for silicide formation at metal–silicon interfaces
Home
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Summary Abstract: Two-stage process for silicide formation at metal–silicon interfaces
Summary Abstract: Two-stage process for silicide formation at metal–silicon interfaces
RN
R. J. Nemanich
R. J. Nemanich
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1 January 1984
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 2
(3)
,
588
https://doi.org/10.1116/1.582848
Abstract
No abstract available
Keywords
SUMMARY ABSTRACT
SILICIDE FORMATION
SILICON INTERFACES
STAGE PROCESS
METAL
Cited by 2 articles